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1

The effects of attentional spread and attentional effort on orientation discrimination

Spitzer, Hedva, Sade, Amikam

Journal:

Year:

1998

Language:

english

File:

PDF, 2.72 MB

english, 1998

2

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - New approach to improve CD uniformity based on mask quality

Liebe, Roman, Jaehnert, Carmen, Gottlib, Gidon, Eran, Yair, Hemar, Shirley, Sade, Amikam, Rosenbusch, Anja, Grenon, Brian J., Dao, Giang T.

Year:

2001

File:

PDF, 510 KB

2001

3

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Novel high-speed approach for CD uniformity mapping and monitoring

Hemar, Shirley, Sade, Amikam, Fandrich, Juergen, Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 829 KB

english, 1999

4

SPIE Proceedings [SPIE 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Munich, Germany (Monday 15 November 1999)] 16th European Conference on Mask Technology for Integrated Circuits and Microcomponents - Innovative approach for concurrent CD-uniformity monitoring and reticle inspection

Sade, Amikam, Fandrich, Juergen, Hemar, Shirley, Eran, Yair, Behringer, Uwe F. W.

Year:

2000

Language:

english

File:

PDF, 4.10 MB

english, 2000

5

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - New approach to mask and wafer performance optimization for system-on-a-chip (SOC) devices

Gottlib, Gidon, Eran, Yair, Hemar, Shirley, Sade, Amikam, Staud, Wolfgang, Dusa, Mircea V., Warila, Steve, Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 1.72 MB

english, 2000

6

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - In-line verification of linewidth uniformity for 0.18 and below: design rule reticles

Tan, TaiSheng, Kuo, Shen C., Wu, Clare, Falah, Reuven, Hemar, Shirley, Sade, Amikam, Gottlib, Gidon, Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 1.28 MB

english, 2000